Solution

High Performance, Compact, Process Development System for Universities, R&D Labs, and More.

CHA's Solution™ Process Development System is a high performance, compact 48.15"D x 46"W x 78.68"H ion beam aided deposition system for processing at universities, R&D labs, etc.

For the Solution, CHA provides a variety of high quality tooling, such as lift-off dome, planetary, variable-angle and others; as well as a wide range of source choices, including swing and resistance.

• Vacuum Chamber
• Type: Water cooled stainless steel
• Size: 18"D x 18"W x 24"H
• Volume: 4.5 ft³
• Inlet flange: NW 50
• Source distance: 15"
  
  
• Tooling Options
  • Lift-off dome capacity examples, 3 x 150mm/5 x 125mm/7 x 100mm/10 x 75mm
  • Planetary dome capacity examples: 9 x 100mm/12 x 75mm
  • Variable angle capacity examples: 3 x 150mm/5 x 125mm/7 x 100mm/9 x 75mm
    
    
• Pumping Options
  • Diffusion: 1200 liters/sec
  • Turbomolecular: 320-600 liters/sec
  • Cryo: 1100 liters/sec
    
    
• Systems Control Options
  • Manual: Autotech sequencer
  • PLC: Siemens touch screen
    
    
• Vapor Source Options
  • Electron beam gun: 4 x 25cc/4 x 40cc/6 x 15cc/6 x 25cc
  • Resistance source
  • Swing source
    
    
• Power Requirement Options
  • Domestic: 120VAC/60Hz, 208VAC/60Hz
  • International: 220VAC/50Hz
    
    
• Pumping Options
  • Cryo
  • Turbo
  • Diffusion
    
    
• Ultimate Vacuum
  • System 10 -9 Torr
  • Chamber 10 -8 Torr
    
    
• Cryo Coil
  • 1,000 L/Sec. pumping speed for water vapor and other condensable gases in the process chamber
    
    
• Footprint
  • 79.5" W x 64"D x 78.5"H (with ISO source add 21"H)

For more details, download the CHA Solution Datasheet (356KB).